Apprehension of Resistive Characteristics of Plasma Ionized Hybrid Nano Fibrous Silicon

Abstract

Literature review done for the study identified number of challenges with the conventional way of manufacturing nano patterned surfaces. Also, it indicated immense potential of nano structured surface as a sensing surface for numerous applications. Without using any complex and expensive conventional nano manufacturing method, synthesis of Hybrid Nano fibrous Silicon structure (HNfSi) was made possible by identifying useful laser and scanning parameters in this study. To employ such structure for various sensing applications as well as new generation batteries and capacitors, understanding of its resistive behavior was quite necessary. In this study, HNfSis bulk resistance and thickness based resistivity with variation in different laser and scanning parameters was studied successfully. Methods like 4-point resistivity measurement and parallel plate electrode configuration was employed to understand resistive behavior of HNfSi. In addition, considering immense surface area available with such structure and its benefits identified with literature review, ImageJ analysis was done to comprehend change in topological constituents and its dimensions with the variation in specified parameters. To understand such change in resistive behavior, various surface and material characterization methods like, SEM (Scanning electron microscope), Raman spectroscopy, light spectroscopy and EDX (Energy-dispersive X-ray spectroscopy) was employed. Overall, with this study, important laser parameters to generate HNfSi was identified successfully and their respective resistive characteristics were understood using mentioned methods.